DocumentCode
609689
Title
Ultra-low-leakage power-rail ESD clamp circuit in a 65-nm CMOS technology
Author
Altolaguirre, F.A. ; Ming-Dou Ker
Author_Institution
Insitute of Electron., Nat. Chiao-Tung Univ., Hsinchu, Taiwan
fYear
2013
fDate
22-24 April 2013
Firstpage
1
Lastpage
4
Abstract
The gate tunneling current impacts seriously on the power-rail ESD clamp circuit, causing a large leakage current through the MOS capacitor used in ESD detection. In this work, a novel technique is implemented to eliminate the gate leakage current through the MOS capacitor by using a couple of transistors to control the voltage drop across the RC delay in the ESD detection circuit. This circuit has been verified in a 65-nm CMOS technology, with a total leakage current of 165nA under 1V bias, at 25°C, and a ESD robustness of 3kV HBM and 200V MM.
Keywords
CMOS integrated circuits; MOS capacitors; electrostatic discharge; low-power electronics; CMOS technology; ESD detection circuit; HBM; MOS capacitor; RC delay; current 165 nA; gate leakage current; gate tunneling current; size 65 nm; temperature 25 C; ultralow-leakage power-rail ESD clamp circuit; voltage 200 V; voltage 3 kV; voltage drop; Capacitors; Clamps; Electrostatic discharges; Integrated circuit modeling; Leakage currents; Thyristors; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Design, Automation, and Test (VLSI-DAT), 2013 International Symposium on
Conference_Location
Hsinchu
Print_ISBN
978-1-4673-4435-7
Type
conf
DOI
10.1109/VLDI-DAT.2013.6533866
Filename
6533866
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