Title :
Ultra-low-leakage power-rail ESD clamp circuit in a 65-nm CMOS technology
Author :
Altolaguirre, F.A. ; Ming-Dou Ker
Author_Institution :
Insitute of Electron., Nat. Chiao-Tung Univ., Hsinchu, Taiwan
Abstract :
The gate tunneling current impacts seriously on the power-rail ESD clamp circuit, causing a large leakage current through the MOS capacitor used in ESD detection. In this work, a novel technique is implemented to eliminate the gate leakage current through the MOS capacitor by using a couple of transistors to control the voltage drop across the RC delay in the ESD detection circuit. This circuit has been verified in a 65-nm CMOS technology, with a total leakage current of 165nA under 1V bias, at 25°C, and a ESD robustness of 3kV HBM and 200V MM.
Keywords :
CMOS integrated circuits; MOS capacitors; electrostatic discharge; low-power electronics; CMOS technology; ESD detection circuit; HBM; MOS capacitor; RC delay; current 165 nA; gate leakage current; gate tunneling current; size 65 nm; temperature 25 C; ultralow-leakage power-rail ESD clamp circuit; voltage 200 V; voltage 3 kV; voltage drop; Capacitors; Clamps; Electrostatic discharges; Integrated circuit modeling; Leakage currents; Thyristors; Transistors;
Conference_Titel :
VLSI Design, Automation, and Test (VLSI-DAT), 2013 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4673-4435-7
DOI :
10.1109/VLDI-DAT.2013.6533866