• DocumentCode
    614282
  • Title

    Efficient algorithm for polygon orthogonal partitioning in stranded-cell LEF generation flow

  • Author

    Makarem, Mohamed Abul ; Dessouky, Mohamed ; El Hennawy, Adel

  • Author_Institution
    Mentor Graphics Corp., Cairo, Egypt
  • fYear
    2013
  • fDate
    27-30 April 2013
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Digital standard cell library become an essential part of digital design flow and the success of integrated circuits; however, with the growing complexity in cell models, generation of a large digital cell library has increased the required processing jobs by 1000x in recent years. Recently users can find library files sized in gigabytes instead of megabytes, which requires a system that runs reliably and rapidly. Moreover, in nanometre technologies, design teams require more corners and complex models that can take 10 times longer than previous technologies. Place and route tools do not require full cell layout view; another abstract view needs to be generated for every standard cell, which is known by library exchange format (LEF). Correct Back-end library creation (LEF) is one of cornerstone for successful digital implementation. Place and route tools as well as layout verification tools rely on detailed LEF view information in digital libraries to accurately realize and verify the final design layout. In this paper, we are proposing new algorithms to partition any GDSII polygon into smaller rectangular polygons. Since current industrial tools do not support nonrectangular polygons, partitioning is one of the main steps in the GDSII to LEF conversion process. The new algorithm is polygon area-based rather than traditional techniques, which are relay on point-based algorithms. The new algorithm makes use of high capabilities of different layout tools in polygon processing to generate the LEF view from GDSII design. The proposed algorithm has been verified using large amount of digital cells from different technologies as 0.13um, 90nm and 45nm.
  • Keywords
    circuit layout CAD; formal verification; integrated circuit layout; network routing; GDSII polygon; GDSII-to-LEF conversion process; LEF view information; correct back-end library creation; digital design flow; digital implementation; digital libraries; digital standard cell library; full cell layout view; integrated circuits; layout verification tools; library exchange format; library files; nanometre technologies; place and route tools; polygon area-based algorithm; polygon orthogonal partitioning algorithm; rectangular polygons; size 0.13 mum; size 45 nm; size 90 nm; stranded-cell LEF generation flow; Clocks; Layout; Libraries; Metals; Partitioning algorithms; Shape; Standards; Abstract view; CAD; Cell view; Design Automation; Digital cell; IC Design flow;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics, Communications and Photonics Conference (SIECPC), 2013 Saudi International
  • Conference_Location
    Fira
  • Print_ISBN
    978-1-4673-6196-5
  • Electronic_ISBN
    978-1-4673-6194-1
  • Type

    conf

  • DOI
    10.1109/SIECPC.2013.6550732
  • Filename
    6550732