• DocumentCode
    614932
  • Title

    Contamination control and pilot manufacturing of commercial grade carbon nanotube colloidal formulations

  • Author

    Smith, Brian ; Kocab, Thomas ; Sen, Rahul ; Roberts, David A.

  • Author_Institution
    Quality Control & Characterization, Nantero, Inc., Boston, MA, USA
  • fYear
    2013
  • fDate
    14-16 May 2013
  • Firstpage
    404
  • Lastpage
    408
  • Abstract
    As an intermediate between discrete molecules and bulk materials, carbon nanotubes (CNTs) require a prescribed mix of processing tactics to scalably transform them from a heterogeneous blend of metal catalysts, amorphous carbons and CNTs into a robust colloidal formulation suitable for spin-on semiconductor applications such as non-volatile memory. In this manuscript, we will show historical quality control (QC) data collected over a four year period on three sequential generations of a single formulation. Results from this data will show that using our controlled processing methods, we can reproducibly prepare liter-scale quantities of spin-on CNTs formulations, meeting quality specifications expected for other electronics-grade thin-film precursors. Presented QC data will highlight our continuous improvement efforts in trace-metal (TM) control which has ultimately allowed us to reduce our process mean from ~40 ppbw total TM to less than 3 ppbw. QC defectivity data gathered from electron and optical microscopy will also be presented on each formulation generation, along with a description of the defect taxonomy developed which has help reduce defectivity in future formulations.
  • Keywords
    carbon nanotubes; colloids; contamination; electron device manufacture; electron microscopy; optical microscopy; quality control; semiconductor device manufacture; semiconductor nanotubes; semiconductor thin films; C; QC; amorphous carbons; commercial grade carbon nanotube colloidal formulations; contamination control; electron microscopy; electronics grade thin film precursors; metal catalysts; nonvolatile memory; optical microscopy; pilot manufacturing; quality control; trace-metal control; Carbon nanotubes; Films; Iron; Process control; Quality control; Carbon Nanotube; Quality Control; Scalable Manufacturing; Semiconductor Grade; thin film;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference (ASMC), 2013 24th Annual SEMI
  • Conference_Location
    Saratoga Springs, NY
  • ISSN
    1078-8743
  • Print_ISBN
    978-1-4673-5006-8
  • Type

    conf

  • DOI
    10.1109/ASMC.2013.6552769
  • Filename
    6552769