DocumentCode
615005
Title
Low loss optical interlayer coupling using reflector-enhanced grating couplers
Author
Jin Yao ; Shubin, Ivan ; Xuezhe Zheng ; Guoliang Li ; Ying Luo ; Thacker, Hiren ; Jin-Hyoung Lee ; Bickford, Justin ; Raj, Kannan ; Cunningham, John E. ; Krishnamoorthy, Ashok V.
Author_Institution
Oracle Labs., San Diego, CA, USA
fYear
2013
fDate
5-8 May 2013
Firstpage
31
Lastpage
32
Abstract
We demonstrate improved optical interlayer coupling based on grating couplers with backside metal reflectors. Losses of 1.5dB and 2.0dB are achieved with 145nm and 220nm grating etch depth on a 130nm SOI CMOS platform, respectively.
Keywords
CMOS integrated circuits; diffraction gratings; etching; integrated optoelectronics; optical couplers; optical losses; silicon-on-insulator; SOI CMOS platform; Si; backside metal reflectors; depth 145 nm; depth 220 nm; grating etch depth; low loss optical interlayer coupling; reflector-enhanced grating couplers; size 130 nm; Couplers; Couplings; Gratings; Loss measurement; Metals; Optical losses; Optical waveguides;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Interconnects Conference, 2013 IEEE
Conference_Location
Santa Fe, NM
Print_ISBN
978-1-4673-5061-7
Electronic_ISBN
978-1-4673-5062-4
Type
conf
DOI
10.1109/OIC.2013.6552909
Filename
6552909
Link To Document