• DocumentCode
    618995
  • Title

    Optimal design of periodic nanostructures formed in solar cells as an antireflective layer

  • Author

    Yating Shi ; Shiyuan Liu ; Jinlong Zhu ; Chuanwei Zhang ; Xiuguo Chen ; Zirong Tang

  • Author_Institution
    Wuhan Nat. Lab. for Optoelectron., Huazhong Univ. of Sci. & Technol., Wuhan, China
  • fYear
    2013
  • fDate
    7-10 April 2013
  • Firstpage
    524
  • Lastpage
    527
  • Abstract
    Recently, periodic nanostructures with a rectangular profile have been widely used in the backside layer of solar cells to reduce the reflectance and to enhance the performance. In this paper, we design solar cells by applying two-dimensional periodic nanostructures with a trapezoidal profile as an antireflective layer. Through intensive simulations using rigorous coupled-wave analysis (RCWA), we attempt to optimize the profile parameters, including the sidewall angle (SWA), the pitch, and the height. Simulation results indicate that the rectangular profile displays a lower reflectance than the trapezoidal profile. Moreover, when the pitch is almost double of the width and the height is 1~2 times of the width, the total reflectance is reduced by 25~35%.
  • Keywords
    design engineering; nanostructured materials; optimisation; periodic structures; solar cells; 2D periodic nanostructures; RCWA; antireflective layer; backside layer; height; optimal periodic nanostructure design; performance enhancement; pitch; profile parameter optimization; rectangular profile; reflectance reduction; rigorous coupled-wave analysis; semiconductor devices; sidewall angle; solar cells; trapezoidal profile; Charge carrier processes; Gratings; Nanostructures; Photovoltaic cells; Reflectivity; Silicon; rectangular profile; rigorous coupled-wave analysis (RCWA); solar cell; trapezoidal profile; two-dimensional periodic nanostructure;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on
  • Conference_Location
    Suzhou
  • Electronic_ISBN
    978-1-4673-6351-8
  • Type

    conf

  • DOI
    10.1109/NEMS.2013.6559784
  • Filename
    6559784