DocumentCode
620679
Title
Analysis on electromechanical coupling coefficients in AlN-based bulk acoustic wave resonators based on first-principle calculations
Author
Yokoyama, Tomoki ; Iwazaki, Yoshiki ; Nishihara, Tokihiro ; Ueda, Makoto
Author_Institution
TAIYO YUDEN Co., Ltd., Akashi, Japan
fYear
2012
fDate
7-10 Oct. 2012
Firstpage
551
Lastpage
554
Abstract
We discuss the effect of aluminum nitride (AlN) film stress on the electromechanical coupling coefficient (k2) of film bulk acoustic resonators (FBAR) based on first-principle calculations and experiments. Our calculations indicate that the compressive stress of AlN film induces the expansion of the c-axis lattice constant and affected the piezoelectric constant of AlN. We found that the piezoelectric constant of AlN and k2 of FBAR estimated using first-principle calculation increase with decreasing compressive stress of AlN films. We also confirmed from experiments that the piezoelectric constant increased from 6.5 to 7.1pC/N due to the decrease in compressive stress. Finally, we fabricated air-gap type FBAR that have different AlN film stresses. As a result, k2 improved from 6.0 to 6.5% by controlling the film stress from -1200 to 0MPa.
Keywords
acoustic resonators; air gaps; aluminium compounds; bulk acoustic wave devices; internal stresses; piezoelectric thin films; AlN; air-gap type FBAR; bulk acoustic wave resonators; c-axis lattice constant; compressive stress; electromechanical coupling coefficients; film bulk acoustic resonators; film stress; piezoelectric constant; Couplings; Film bulk acoustic resonators; Films; III-V semiconductor materials; Lattices; Residual stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium (IUS), 2012 IEEE International
Conference_Location
Dresden
ISSN
1948-5719
Print_ISBN
978-1-4673-4561-3
Type
conf
DOI
10.1109/ULTSYM.2012.0137
Filename
6561923
Link To Document