DocumentCode
628478
Title
Use of compliant interconnects for drop impact isolation
Author
Wei Chen ; Bhat, Aruna ; Sitaraman, Suresh K.
Author_Institution
George W. Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2013
fDate
28-31 May 2013
Firstpage
835
Lastpage
839
Abstract
Compliant interconnects are able to mechanically decouple die from substrate and are helpful in reducing thermally-induced stresses in the die. In this paper, we report drop-test modeling of die-substrate assemblies with compliant interconnects. Simulations using explicit ANSYS/LS-DYNA® solver were carried out to mimic typical experimental conditions and to gain a better understanding of the overall response of the compliant interconnects under shock and impact loading. The finite-element models simulated dropping of die-substrate assemblies with compliant interconnects from different heights. The results from these simulations were compared against drop simulations of die-substrate assemblies with bump interconnects. The simulation results show that the compliant interconnects can significantly reduce the strains in the die under drop testing, while the bump interconnect does not have such an advantage.
Keywords
assembling; finite element analysis; integrated circuit interconnections; ANSYS/LS-DYNA solver; bump interconnect; compliant interconnect; die-substrate assembly; drop impact isolation; drop-test modeling; finite-element model; impact loading; shock loading; strain reduction; thermally-induced stress reduction; Analytical models; Computational modeling; Finite element analysis; Load modeling; Loading; Strain; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
Conference_Location
Las Vegas, NV
ISSN
0569-5503
Print_ISBN
978-1-4799-0233-0
Type
conf
DOI
10.1109/ECTC.2013.6575670
Filename
6575670
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