DocumentCode
628482
Title
Power comparison of 2D, 3D and 2.5D interconnect solutions and power optimization of interposer interconnects
Author
Karim, M.A. ; Franzon, Paul D. ; Kumar, Ajit
Author_Institution
North Carolina State Univ., Raleigh, NC, USA
fYear
2013
fDate
28-31 May 2013
Firstpage
860
Lastpage
866
Abstract
This paper compares the power efficiency of multiple 2D, 2.5D and 3D interconnect scenarios, specifically DDR3 with PCB, DDR3 with interposers, LPDDR2(3) with POP, wide I/Os with through-silicon vias (TSVs) and interposers and 32 nm technology CMOS drivers with TSVs and on-chip wires. It was found that DDR3 with PCB is the lowest power efficiency (15.65 mW/Gbps) and custom designed CMOS drivers optimized for the 2.5D and 3D give the highest power efficiency (0.23mW/Gbps). Optimization of a Back End of the Line (BEOL) 65 nm interposer interface is also presented for Wide IO interface to find maximize power efficiency. Power efficiency for different interposer trace lengths (5mm-40mm) and pitches (4.6μm-11.05μm) was analyzed. It was found that power efficiency decreases linearly with the increase of pitch and length of the interposer traces both in one stack and 4 stack die of Wide IO.
Keywords
CMOS integrated circuits; interconnections; optimisation; three-dimensional integrated circuits; 2.5D interconnect solution; 2D interconnect solution; 3D interconnect solution; BEOL; CMOS driver; DDR3; LPDDR2; PCB; POP; TSV; interposer interconnection; optimization; power efficiency; power optimization; size 32 mm; size 4.6 mum to 11.05 mum; size 65 nm; stack die; through-silicon-vias; wide I/O; CMOS integrated circuits; Capacitors; Electrostatic discharges; Integrated circuit interconnections; Receivers; Simulation; Through-silicon vias;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
Conference_Location
Las Vegas, NV
ISSN
0569-5503
Print_ISBN
978-1-4799-0233-0
Type
conf
DOI
10.1109/ECTC.2013.6575674
Filename
6575674
Link To Document