DocumentCode :
630155
Title :
1/f Noise of accumulation mode p- and n-MOSFETs
Author :
Gaubert, Philippe ; Teramoto, A. ; Ohmi, Tadahiro ; Sugawa, Shigetoshi
Author_Institution :
New Ind. Creation Hatchery Center, Tohoku Univ., Sendai, Japan
fYear :
2013
fDate :
24-28 June 2013
Firstpage :
1
Lastpage :
4
Abstract :
The noise of inversion and accumulation mode MOSFETs has been compared and analysed in terms of doping concentration. For low doping concentration, both devices have similar noise levels. The increase of the doping concentration results in a degradation of the noise to the disadvantage of the accumulation mode n-MOSFETs while its level remains unchanged for the p-MOSFETs. A further increase leads to a drastic reduction of the noise in favour of both accumulation mode n- an p-MOSFETs on account of a change in the nature of the noise source.
Keywords :
1/f noise; MOSFET; semiconductor device noise; semiconductor doping; 1/f noise; accumulation mode n-MOSFET; accumulation mode p-MOSFET; doping concentration; Doping; Logic gates; Low-frequency noise; MOSFET; MOSFET circuits; Silicon-on-insulator;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Noise and Fluctuations (ICNF), 2013 22nd International Conference on
Conference_Location :
Montpellier
Print_ISBN :
978-1-4799-0668-0
Type :
conf
DOI :
10.1109/ICNF.2013.6578879
Filename :
6578879
Link To Document :
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