• DocumentCode
    649116
  • Title

    Thermally controlled vanadium dioxide thin film microwave devices

  • Author

    Subramanyam, Guru ; Shin, Eun-Hee ; Brown, Dean ; Yue, Haosong

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Dayton, Dayton, OH, USA
  • fYear
    2013
  • fDate
    4-7 Aug. 2013
  • Firstpage
    73
  • Lastpage
    76
  • Abstract
    Vanadium dioxide (VO2) thin films have unique insulator to metal transition above the critical temperature of 68 °C. In this study, VO2 thin films were deposited on a sapphire substrate for thermally controllable RF/microwave devices such as switches, limiters and resonators. The selectively deposited VO2 thin film based devices showed ~2 kΩ at room temperature and less than 2 Ω at 70 °C. These thermally controlled varistors were utilized in shunt as well as series configurations for microwave switching and in resonant structures. Switching devices designed using a VO2 shunt varistor showed good isolation (>20 dB) and low insertion loss (<;1 dB) up to 20 GHz. This paper presents two types of shunt varistor devices designed and fabricated on sapphire substrates.
  • Keywords
    microwave resonators; microwave switches; sapphire; thin films; vanadium compounds; varistors; VO2; frequency 20 GHz; microwave devices; microwave switching; resonant structures; sapphire substrate; shunt varistor devices; temperature 293 K to 298 K; temperature 68 degC; temperature 70 degC; thermally controlled vanadium dioxide thin film; thermally controlled varistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems (MWSCAS), 2013 IEEE 56th International Midwest Symposium on
  • Conference_Location
    Columbus, OH
  • ISSN
    1548-3746
  • Type

    conf

  • DOI
    10.1109/MWSCAS.2013.6674588
  • Filename
    6674588