DocumentCode
657251
Title
Proposal of shear stress sensor based on optical detection
Author
Eto, Y. ; Shibata, Satoshi ; Shikida, Mitsuhiro
Author_Institution
Dept. of Mech. Sci. Eng., Nagoya Univ., Nagoya, Japan
fYear
2013
fDate
3-6 Nov. 2013
Firstpage
1
Lastpage
4
Abstract
A shear stress sensor based on an optical detection is proposed. The sensor consists of the floating element and the optical 45-degree micro-mirror. It has advantages that it can detect the shear stress directly, and is not sensitive for the electrical noise. The mirror having 45 degree slope is successfully fabricated onto Si{110} surface by applying KOH anisotropic wet etching. The floating element is produced in device layer of SOI wafer, and movement of the element by applying the airflow is also confirmed.
Keywords
elemental semiconductors; etching; microfabrication; micromirrors; microsensors; optical fabrication; optical noise; optical sensors; silicon; silicon-on-insulator; wetting; KOH anisotropic wet etching; SOI wafer; Si; airflow; electrical noise; floating element; optical 45-degree micro-mirror; optical detection; shear stress sensor; Fluids; Geometrical optics; Laser beams; Mirrors; Optical device fabrication; Optical sensors; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
SENSORS, 2013 IEEE
Conference_Location
Baltimore, MD
ISSN
1930-0395
Type
conf
DOI
10.1109/ICSENS.2013.6688537
Filename
6688537
Link To Document