DocumentCode
666381
Title
Two-step scaling micro-macro bilateral control using double master slave system
Author
Iwata, Satoru ; Matsumi, Y. ; Ohnishi, Kengo
Author_Institution
Dept. of Syst. Design Eng., Keio Univ., Yokohama, Japan
fYear
2013
fDate
10-13 Nov. 2013
Firstpage
4300
Lastpage
4305
Abstract
Many studies on bilateral control based on 4ch bilateral controller have been carried out hitherto. Micro-macro bilateral control is an application of this method for micro manipulations. Micro-macro bilateral control enables magnifying and demagnifying the force information using scaling gains. However, in the case of a single system as a conventional method, there is a limit of scaling because of instability. This paper analyzes the stability of conventional method considering scaling gain by using root locus analysis. Furthermore, it proposes a two-step scaling micro-macro bilateral control using double master slave system as a new solution. For the new system, two master slave systems are used and connected to each other. A stable whole system is realized by connecting two stable systems with suitable scaling gain. Thus, the proposed method enables a higher scaling micro-macro bilateral control with multiplication of two scalings. Simulations and experimental results are given to show the validity of the proposed method. Comparison with conventional method is achieved by using stability analysis and experiments.
Keywords
manipulators; microcontrollers; motion control; stability; 4ch bilateral controller; double master slave system; force information; instability; master slave systems; micro manipulations; root locus analysis; stability analysis; two-step scaling micro-macro bilateral control; Control systems; Equations; Force; Frequency modulation; Manganese; Observers; Stability analysis; Motion control; disturbance observer; haptics; master slave system; micro-macro bilateral control; scaling;
fLanguage
English
Publisher
ieee
Conference_Titel
Industrial Electronics Society, IECON 2013 - 39th Annual Conference of the IEEE
Conference_Location
Vienna
ISSN
1553-572X
Type
conf
DOI
10.1109/IECON.2013.6699826
Filename
6699826
Link To Document