DocumentCode
671192
Title
Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi´s L27 orthogonal array
Author
Menon, P. Susthitha ; Tasirin, S. Kalthom ; Ahmad, Ishtiaq ; Abdullah, S. Fazlili ; Apte, Prakash R.
Author_Institution
Inst. of Microeng. & Nanoelectron. (IMEN), Univ. Kebangsaan Malaysia, Bangi, Malaysia
fYear
2013
fDate
25-27 Sept. 2013
Firstpage
254
Lastpage
257
Abstract
Silicon-on-insulator (SOI)-based lateral PIN photodiodes using SiGe/Si multilayer quantum wells (MQW) are suitable for applications in the near-infrared range both for sensing and optical fiber communication application. The objective of this paper is to optimize the process parameters for such a device using Taguchi´s L27 orthogonal array. Five device process parameters and two device noise factors were identified to make the virtual device design insensitive to variation in the selected fabrication parameters. The results obtained for responsivity after the optimization approach was 0.33 A/W for the optimized device with intrinsic region length of 6 μm, photo-absorption layer thickness of 0.505 μm, incident optical power of 0.5 mW/cm2, bias voltage of 3.5 V and SOI layer thickness of 0.5 μm. The percentage of improvement for the device´s responsivity is 27% as compared to the previous work.
Keywords
Ge-Si alloys; Taguchi methods; elemental semiconductors; integrated optoelectronics; optical design techniques; optical fabrication; p-i-n photodiodes; photodetectors; photoexcitation; semiconductor device noise; semiconductor quantum wells; silicon; silicon-on-insulator; MQW SOI-based lateral PIN photodiode; SiGe-Si; Taguchi L27 orthogonal array; bias voltage; device noise factors; device process parameters; fabrication parameters; incident optical power; intrinsic region length; multilayer quantum wells; near-infrared range; optical fiber communication; photoabsorption layer thickness; responsivity optimization; sensing application; silicon-on-insulator; size 0.5 mum; size 0.505 mum; virtual device design; voltage 3.5 V; Arrays; Optimization; PIN photodiodes; Quantum well devices; Silicon; Silicon germanium; L27 orthogonal array; SOI; SiGe/Si; Taguchi method; photodiode; quantum dot;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro and Nanoelectronics (RSM), 2013 IEEE Regional Symposium on
Conference_Location
Langkawi
Print_ISBN
978-1-4799-1181-3
Type
conf
DOI
10.1109/RSM.2013.6706523
Filename
6706523
Link To Document