Effect of nitrogen concentrations on electrical properties of amorphous carbon thin films by using palm oil precursor

Amorphous carbon thin films with thickness 39.6-990. 1nm on insulative glass substrates were deposited by bias-assisted pyrolysis-CVD using `green´ renewable precursor palm oil. The effect of nitrogen concentrations used on electrical properties of amorphous carbon thin films was determined. The amorphous carbon thin films were characterized by current-voltage measurement, UV/VIS spectrophotometer, surface profiler, and atomic force microscopy. Most of thin films were formed linear region with difference respond of slopes. High slope of ohmic contact for sample 220 mL/min was obtained after nitrogen doping. The sample 220 mL/min showed the optimum slope and the highest current responding. The resistivity was decreased by nitrogen concentration used where samples 220 mL/min and 70 mL/min were the lowest and the highest resistivity, respectively. We found, doping with nitrogen were increased the conductivity and photo response and decreased the resistivity of a-C thin films as compared without use of nitrogen.