DocumentCode :
671297
Title :
Non-etching adhesion promoter for dry film for semi-additive manufacturing — Advanced dry film pre-treatment
Author :
Tews, D. ; Michalik, F. ; Haidar, R. ; Thoms, M. ; Goh, Mark ; Li, Sinan
Author_Institution :
Atotech Deutschland GmbH, Berlin, Germany
fYear :
2013
fDate :
22-25 Oct. 2013
Firstpage :
31
Lastpage :
34
Abstract :
The technological development of new gadgets is a competitive race that consists of a continuous striving for additional features, higher performance and cost minimization. These needs drive the permanent requirement for new and revolutionary developments, especially in the IC-packaging industry. In this paper, findings from the development of a Non Etching Adhesion Promoter (NEAP) process, specifically for dry film pretreatment, are described and discussed. It also outlines detailed results that were obtained on process performance and the clear benefits to the industry of this new and innovative approach.
Keywords :
adhesion; etching; integrated circuit packaging; IC packaging industry; NEAP process; dry film pretreatment; nonetching adhesion promoter; semiadditive manufacturing; Adhesives; Copper; Etching; Films; Resists; Surface topography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2013 8th International
Conference_Location :
Taipei
ISSN :
2150-5934
Type :
conf
DOI :
10.1109/IMPACT.2013.6706633
Filename :
6706633
Link To Document :
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