Title :
Non-etching adhesion promoter for dry film for semi-additive manufacturing — Advanced dry film pre-treatment
Author :
Tews, D. ; Michalik, F. ; Haidar, R. ; Thoms, M. ; Goh, Mark ; Li, Sinan
Author_Institution :
Atotech Deutschland GmbH, Berlin, Germany
Abstract :
The technological development of new gadgets is a competitive race that consists of a continuous striving for additional features, higher performance and cost minimization. These needs drive the permanent requirement for new and revolutionary developments, especially in the IC-packaging industry. In this paper, findings from the development of a Non Etching Adhesion Promoter (NEAP) process, specifically for dry film pretreatment, are described and discussed. It also outlines detailed results that were obtained on process performance and the clear benefits to the industry of this new and innovative approach.
Keywords :
adhesion; etching; integrated circuit packaging; IC packaging industry; NEAP process; dry film pretreatment; nonetching adhesion promoter; semiadditive manufacturing; Adhesives; Copper; Etching; Films; Resists; Surface topography;
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2013 8th International
Conference_Location :
Taipei
DOI :
10.1109/IMPACT.2013.6706633