• DocumentCode
    671334
  • Title

    Wafer bonding type selection for 3D IC designs

  • Author

    Shih-Hsu Huang ; Hua-Hsin Yeh ; Chun-Hua Cheng

  • Author_Institution
    Dept. of Electron. Eng., Chung Yuan Christian Univ., Chungli, Taiwan
  • fYear
    2013
  • fDate
    22-25 Oct. 2013
  • Firstpage
    198
  • Lastpage
    201
  • Abstract
    The minimization of TSV (through-silicon-via) count is one of the most important objectives in the 3D IC (three-dimensional integrated circuit) design. In this paper, we demonstrate that the selection of wafer bonding type for each pair of adjacent layers has a great impact on the TSV count. However, to the best of our knowledge, given a layer assignment result, the problem of selecting wafer bonding type for TSV count minimization has not been well studied. Based on that observation, we are motivated to use the network flow to formally model the problem and then use the shortest path approach to minimize the TSV count. Note that our shortest path approach guarantees solving this TSV count minimization problem optimally in polynomial time complexity. Compared with the previous high-level synthesis approach that only performs layer assignment to minimize the TSV count, benchmark data show that our approach can further reduce 48.38% TSV count through wafer bonding type selection.
  • Keywords
    integrated circuit design; minimisation; three-dimensional integrated circuits; wafer bonding; 3D IC designs; TSV; minimization problem; polynomial time complexity; shortest path approach; through-silicon-via; wafer bonding type selection; Bonding; Metallization; Minimization; Three-dimensional displays; Through-silicon vias; Wafer bonding; Electronic Design Automation; High-Level Synthesis; Layer Assignment; Three-Dimensional Integrated Circuit; Through-Silicon-Via;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2013 8th International
  • Conference_Location
    Taipei
  • ISSN
    2150-5934
  • Type

    conf

  • DOI
    10.1109/IMPACT.2013.6706670
  • Filename
    6706670