DocumentCode :
675584
Title :
Possibility of SOI based super steep subthreshold slope MOSFET for ultra low voltage application
Author :
Mori, Takayoshi ; Ida, Jiro
Author_Institution :
Dept. of Electr. & Electron. Eng., Kanazawa Inst. of Technol., Kanazawa, Japan
fYear :
2013
fDate :
7-10 Oct. 2013
Firstpage :
1
Lastpage :
2
Abstract :
Ultra Low Power (ULP) LSI´s require the steep subthreshold slope (SS) MOSFET. However, the theoretical SS limit of the conventional MOSFET is 60mV/dec at the room temperature. Recently, devices which have the less than 60mV/dec SS, such as the Tunnel FET (TFET) and the Impact Ionization MOS (I-MOS), have been studied. In addition to those, the steep SS MOSFET´s using the Floating-Body (FB) SOI have been proposed. In this work, we report our finding of the FB and the Body-Tied (BT) SOI MOSFET with the super steep SS (<; 1mV/Dec) characteristics with the 0.15um SOI. We also discuss the possibility of it as a switching device for the ultra low voltage application, where we consider that the three points are the issues to improve; reducing the operation voltage, increasing Ion/Ioff ratios which also pay attention keeping the low Ioff, controlling hysteresis characteristics.
Keywords :
MOSFET; elemental semiconductors; low-power electronics; silicon; silicon-on-insulator; switches; BT SOI MOSFET; FB SOI MOSFET; I-MOS; ION-IOFF ratio; SS MOSFET; TFET; ULP LSI; body-tied SOI MOSFET; controlling hysteresis characteristics; floating-body SOI MOSFET; impact ionization MOS; size 0.15 mum; super steep subthreshold slope MOSFET; switching device; temperature 293 K to 298 K; tunnel FET; ultralow power LSI; ultralow voltage application; Hysteresis; Logic gates; Low voltage; MOSFET; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2013 IEEE
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/S3S.2013.6716550
Filename :
6716550
Link To Document :
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