• DocumentCode
    67585
  • Title

    Effect of Number of Bilayers on the Anomalous Hall Effect in [Si/Fe]N Multilayers

  • Author

    Das, Suvra Sekhar ; Kumar, M. Senthil

  • Author_Institution
    Dept. of Phys., IIT Bombay, Mumbai, India
  • Volume
    50
  • Issue
    11
  • fYear
    2014
  • fDate
    Nov. 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The influence of varying the number of bilayers (N) on the anomalous Hall effect (AHE) in sputtered Si/Fe multilayers has been investigated. Both the AHE and magnetization data reveal the in-plane magnetic anisotropy in the samples. Large enhancement of ~24 times in the saturation anomalous Hall resistance (RhsA) and anomalous Hall sensitivity (S), has been observed upon decreasing N from 20 to 1. When compared with the bulk Fe, the values of RhsA and anomalous Hall coefficient, Rs obtained for N = 1 were enhanced by about five and three orders of magnitudes, respectively. The Rs follows the longitudinal electrical resistivity ρ as Rsαρ2.1, suggesting side jump as the dominant mechanism of the AHE. S as high as 22 Ω/T over a wide operational field range from -8 to 8 kOe has been obtained for N = 1.
  • Keywords
    Hall effect; iron; magnetic anisotropy; magnetic multilayers; magnetoresistance; silicon; sputter deposition; Si-Fe; [Si-Fe]N multilayers; anomalous Hall effect; anomalous Hall sensitivity; bilayer number effect; in-plane magnetic anisotropy; longitudinal electrical resistivity; magnetization data; saturation anomalous Hall resistance; sputtered Si-Fe multilayers; Hall effect; Iron; Magnetic anisotropy; Magnetic multilayers; Nonhomogeneous media; Saturation magnetization; Silicon; Anomalous Hall effect (AHE); giant Hall effect; magnetic multilayers; scaling law;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2014.2328631
  • Filename
    6971287