DocumentCode
67585
Title
Effect of Number of Bilayers on the Anomalous Hall Effect in [Si/Fe]N Multilayers
Author
Das, Suvra Sekhar ; Kumar, M. Senthil
Author_Institution
Dept. of Phys., IIT Bombay, Mumbai, India
Volume
50
Issue
11
fYear
2014
fDate
Nov. 2014
Firstpage
1
Lastpage
4
Abstract
The influence of varying the number of bilayers (N) on the anomalous Hall effect (AHE) in sputtered Si/Fe multilayers has been investigated. Both the AHE and magnetization data reveal the in-plane magnetic anisotropy in the samples. Large enhancement of ~24 times in the saturation anomalous Hall resistance (RhsA) and anomalous Hall sensitivity (S), has been observed upon decreasing N from 20 to 1. When compared with the bulk Fe, the values of RhsA and anomalous Hall coefficient, Rs obtained for N = 1 were enhanced by about five and three orders of magnitudes, respectively. The Rs follows the longitudinal electrical resistivity ρ as Rsαρ2.1, suggesting side jump as the dominant mechanism of the AHE. S as high as 22 Ω/T over a wide operational field range from -8 to 8 kOe has been obtained for N = 1.
Keywords
Hall effect; iron; magnetic anisotropy; magnetic multilayers; magnetoresistance; silicon; sputter deposition; Si-Fe; [Si-Fe]N multilayers; anomalous Hall effect; anomalous Hall sensitivity; bilayer number effect; in-plane magnetic anisotropy; longitudinal electrical resistivity; magnetization data; saturation anomalous Hall resistance; sputtered Si-Fe multilayers; Hall effect; Iron; Magnetic anisotropy; Magnetic multilayers; Nonhomogeneous media; Saturation magnetization; Silicon; Anomalous Hall effect (AHE); giant Hall effect; magnetic multilayers; scaling law;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2014.2328631
Filename
6971287
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