• DocumentCode
    688708
  • Title

    CMOS-compatible titanium dioxide deposition for athermalization of silicon photonic waveguides

  • Author

    Kuanping Shang ; Djordjevic, Stevan S. ; Jun Li ; Ling Liao ; Basak, Juthika ; Hai-Feng Liu ; Yoo, S.J.B.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of California, Davis, Davis, CA, USA
  • fYear
    2013
  • fDate
    9-14 June 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We discuss titanium dioxide material development for CMOS compatible fabrication and integration of athermal silicon photonic components. Titanium dioxide overclad ring modulators achieved athermal operation (<; 0.2 GHz/°C).
  • Keywords
    CMOS integrated circuits; elemental semiconductors; integrated optics; integrated optoelectronics; optical fabrication; optical modulation; optical waveguides; silicon; titanium compounds; CMOS-compatible titanium dioxide deposition; TiO2-Si; athermalization; overclad ring modulators; silicon photonic waveguides; titanium dioxide material development; Optical device fabrication; Optical films; Optical ring resonators; Optical waveguides; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2013 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    6833083
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=688708