DocumentCode
689589
Title
Tailoring of low chromatic dispersion over a broadband in silicon waveguides using a double-slot design
Author
Changjing Bao ; Yan Yan ; Lin Zhang ; Yang Yue ; Willner, Alan E.
Author_Institution
Dept. of Electr. Eng., Univ. of Southern California, Los Angeles, CA, USA
fYear
2013
fDate
9-14 June 2013
Firstpage
1
Lastpage
2
Abstract
We propose horizontal double-slot silicon waveguide to tailor the dispersion and achieve flattened and low dispersion with a bandwidth of 878 nm from -17 to 23 ps/(km·nm). Supercontinuum in all-normal dispersion with 3 dB bandwidth of 188 nm is generated in doubleslot waveguide.
Keywords
elemental semiconductors; optical design techniques; optical dispersion; optical waveguides; silicon; supercontinuum generation; Si; all-normal dispersion; chromatic dispersion; double-slot design; horizontal double-slot silicon waveguide; supercontinuum generation; Bandwidth; Chromatic dispersion; Optical waveguides; Optimized production technology; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
6833976
Link To Document