DocumentCode :
689589
Title :
Tailoring of low chromatic dispersion over a broadband in silicon waveguides using a double-slot design
Author :
Changjing Bao ; Yan Yan ; Lin Zhang ; Yang Yue ; Willner, Alan E.
Author_Institution :
Dept. of Electr. Eng., Univ. of Southern California, Los Angeles, CA, USA
fYear :
2013
fDate :
9-14 June 2013
Firstpage :
1
Lastpage :
2
Abstract :
We propose horizontal double-slot silicon waveguide to tailor the dispersion and achieve flattened and low dispersion with a bandwidth of 878 nm from -17 to 23 ps/(km·nm). Supercontinuum in all-normal dispersion with 3 dB bandwidth of 188 nm is generated in doubleslot waveguide.
Keywords :
elemental semiconductors; optical design techniques; optical dispersion; optical waveguides; silicon; supercontinuum generation; Si; all-normal dispersion; chromatic dispersion; double-slot design; horizontal double-slot silicon waveguide; supercontinuum generation; Bandwidth; Chromatic dispersion; Optical waveguides; Optimized production technology; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
6833976
Link To Document :
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