DocumentCode
689649
Title
Laser-based plasma sources at 6.6 and 60 nm
Author
Masnavi, Majid ; Szilagyi, John ; Parchamy, Homaira ; Richardson, Martin C.
Author_Institution
Coll. of Opt. & Photonics, Univ. of Central Florida, Orlando, FL, USA
fYear
2013
fDate
9-14 June 2013
Firstpage
1
Lastpage
2
Abstract
Potential high power laser-based xenon and terbium plasma sources are identified based on the reflectivity profiles of the available LaN/B4C, LaN/B, and Al/Yb/Sio multilayer mirrors for applications such as surface processing and semiconductor industry.
Keywords
laser mirrors; light sources; plasma sources; reflectivity; terbium; xenon; Tb; Xe; high power laser-based terbium plasma sources; high power laser-based xenon plasma sources; multilayer mirrors; reflectivity profiles; semiconductor industry applications; surface processing applications; wavelength 6.6 nm; wavelength 60 nm; Lasers; Mirrors; Plasma sources; Plasma temperature; Ultraviolet sources; Xenon;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
6834036
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