Title :
Nanolithography based on two-surface-plasmon-polariton-absorption
Author :
Yunxiang Li ; Fang Liu ; Long Xiao ; Yidong Huang
Author_Institution :
Dept. of Electron. Eng., Tsinghua Univ., Beijing, China
Abstract :
Nanolithography utilizing the nonlinear absorption of two surface plasmon polaritons in resists has been demonstrated. The linewidth of ~λ0/11 are achieved by illuminating the plasmonic mask with the femtosecond laser, which is potential for future nanofabrication.
Keywords :
high-speed optical techniques; masks; nanofabrication; nanolithography; photoresists; polaritons; surface plasmons; femtosecond laser; linewidth; nanofabrication; nanolithography; nonlinear absorption; plasmonic mask; resists; two-surface plasmon polariton absorption; Interference; Lighting; Nanolithography; Plasmons; Resists; Ultrafast optics;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location :
San Jose, CA
