DocumentCode
692159
Title
Heat dissipation mechanisms in resistive switching devices
Author
Yalon, E. ; Ritter, Daniel ; Riess, I.
Author_Institution
Electr. Eng. Dept., Technion - Israel Inst. of Technol., Haifa, Israel
fYear
2013
fDate
12-14 Aug. 2013
Firstpage
1
Lastpage
4
Abstract
The local temperature plays a key role in resistive switching devices. We have previously presented a method to experimentally evaluate the filament temperature using metal-insulator-semiconductor bipolar transistor structure. In light of the experimental results, we discuss here the various possible heat dissipation mechanisms, and compare thermal simulations to the measured temperatures. The simulations are consistent with our experimental data for a filament tip diameter of ~1nm.
Keywords
bipolar transistors; cooling; random-access storage; semiconductor device packaging; Joule heating; heat dissipation mechanism; metal-insulator-semiconductor bipolar transistor structure; resistive RAM; resistive switching devices; thermal simulations; Bipolar transistors; Electrodes; Heating; Switches; Thermal conductivity; Thermal resistance; Tunneling; Joule heating; RRAM; bipolar transistor; conductive filaments; resistive switching;
fLanguage
English
Publisher
ieee
Conference_Titel
Non-Volatile Memory Technology Symposium (NVMTS), 2013 13th
Conference_Location
Minneapolis, MN
Type
conf
DOI
10.1109/NVMTS.2013.6851051
Filename
6851051
Link To Document