Title :
Heat spreading revisited – effective heat spreading angle
Author :
Schweitzer, Dirk ; Liu Chen
Author_Institution :
Infineon Technol. AG, Neubiberg, Germany
Abstract :
There is probably no thermal engineer who has not yet developed his or her own spreadsheet to calculate the thermal resistance of a layered structure such as the chip / die-attach / lead-frame stack in a power semiconductor. The more sophisticated versions of such spreadsheets consider also the effect of heat-spreading inside the layers, usually assuming a constant spreading angle which is often chosen to be 45°. As simple as this approach is as poor are often the results compared to Finite Element simulations or measurements. Herein we propose a definition of the effective heat-spreading angle which is based on the local variation of the heat-flux density along the heat-flow path. Using this definition it is possible to accurately calculate the heat-spreading angle inside a given structure and thus to develop more accurate heat spreading models e.g. for spreadsheet calculations.
Keywords :
finite element analysis; heat transfer; power semiconductor devices; thermal resistance; chip-die-attach-lead-frame stack; effective constant heat spreading angle; finite element measurements; finite element simulations; heat-flow path; heat-flux density; layered structure; local variation; power semiconductor; spreadsheet calculations; thermal engineer; thermal resistance; Boundary conditions; Heat transfer; Heating; Lead; Microassembly; Thermal resistance; Heat flux; Rth-JC; heat spreading angle;
Conference_Titel :
Thermal Measurement, Modeling & Management Symposium (SEMI-THERM), 2015 31st
Conference_Location :
San Jose, CA
DOI :
10.1109/SEMI-THERM.2015.7100145