• DocumentCode
    709840
  • Title

    Impact of P/E cycling on read current fluctuation of NOR Flash memory cell: A microscopic perspective based on low frequency noise analysis

  • Author

    Xiaonan Yang ; Jing Liu ; Zhiwei Zheng ; Yan Wang ; Dandan Jiang ; Shengfen Chiu ; Hanming Wu ; Ming Liu

  • Author_Institution
    Inst. of Microelectron., Beijing, China
  • fYear
    2015
  • fDate
    19-23 April 2015
  • Abstract
    The impact of program/erase (P/E) cycling on the read current fluctuation of 65nm NOR Flash memories is studied in detail. Random telegraph noise (RTN) and 1/f noise analysis are employed to characterize the process induced trap (PIT) and the stress induced trap (SIT) in the tunnel oxide of the floating gate memory cells. The relationship between RTN traps and the read current fluctuation after different P/E cycles is analyzed from a microscopic perspective. Experimental results show that discernible transition between RTN and 1/f noise can be detected at the initial phase of the cycling (<;100 cycles), depending on the gate bias voltage (Vg). As the cycle number increases, the transition phenomenon disappears and 1/f noise dominates. This phenomenon can be detected both in program and erase states, and is interpreted by spectroscopy analysis of PIT and SIT.
  • Keywords
    1/f noise; flash memories; logic gates; 1/f noise analysis; NOR flash memories; floating gate memory cells; gate bias voltage; low frequency noise analysis; process induced trap; program-erase cycling; random telegraph noise; read current fluctuation; stress induced trap; 1f noise; Fluctuations; Logic gates; Microscopy; Silicon; Threshold voltage; 1/f noise; Cycling; NOR flash memory; Random telegraph noise;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2015 IEEE International
  • Conference_Location
    Monterey, CA
  • Type

    conf

  • DOI
    10.1109/IRPS.2015.7112748
  • Filename
    7112748