• DocumentCode
    711696
  • Title

    Simultaneous RF electrical conductivity and topography mapping of smooth and rough conductive traces using microwave microscopy to identify localized variations

  • Author

    Cordoba-Erazo, Maria F. ; Rojas-Nastrucci, Eduardo A. ; Weller, Thomas

  • Author_Institution
    Dept. of Electr. Eng., Univ. of South Florida, Tampa, FL, USA
  • fYear
    2015
  • fDate
    13-15 April 2015
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    This paper presents a near-field microwave microscope (NFMM) capable of simultaneous non-contact imaging of electrical conductivity (σ) and topography across the surface of microwave circuits without the need of a distance sensor. The microscope monitors the resonant frequency of a dielectric resonator-based microwave probe to acquire the surface topography, and the quality factor to determine the electrical conductivity. Conductivity and topography images of copper foil reveal an average conductivity of about 4e7 S/m and an arithmetic roughness of 0.2μm, respectively. Measured average roughness and conductivity of CB028 silver paste are 0.7e6 S/m and 1.1μm, respectively. The NFMM data reveal significant and correlated variation in surface features and conductivity across the surface of the printed CB028 films. The topography and conductivity images obtained demonstrate that the NFMM can be employed for localized characterization of smooth and rough conductive materials used in microwave devices.
  • Keywords
    Q-factor measurement; conducting materials; dielectric resonators; electrical conductivity measurement; microwave circuits; microwave detectors; microwave imaging; microwave resonators; surface topography measurement; thin film sensors; CB028 silver paste; NFMM; RF electrical conductivity; arithmetic roughness measurement; copper foil; dielectric resonator-based microwave probe; distance sensor; microwave circuit; microwave device; microwave microscopy; near-field microwave microscope; noncontact imaging; printed CB028 films; quality factor; rough conductive material; smooth conductive material; surface topography; topography mapping; Area measurement; Atmospheric measurements; Copper; Imaging; Particle measurements; Performance evaluation; Radio frequency; additive manufacturing; electrical conductivity; near-field microwave microscope; surface topography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Wireless and Microwave Technology Conference (WAMICON), 2015 IEEE 16th Annual
  • Conference_Location
    Cocoa Beach, FL
  • Type

    conf

  • DOI
    10.1109/WAMICON.2015.7120385
  • Filename
    7120385