• DocumentCode
    71466
  • Title

    Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography

  • Author

    Okayama, Hideaki ; Shimura, Daisuke ; Onawa, Yosuke ; Takahashi, Hiroki ; Seki, Morihiro ; Koshino, Keiji ; Yokoyama, Naoki ; Oshtsuka, M. ; Tsuchizawa, Tai ; Nishi, Hidetaka ; Yamada, Koji ; Yaegashi, Hiroki ; Horikawa, Tsuyoshi ; Sasaki, Hiromu

  • Author_Institution
    Institute for Photonics-Electronics Convergence System Technology (PECST) and Photonics Electronics Technology Research Association (PETRA), Japan
  • Volume
    49
  • Issue
    22
  • fYear
    2013
  • fDate
    Oct. 24 2013
  • Firstpage
    1401
  • Lastpage
    1402
  • Abstract
    A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion. An improved crosstalk of -23 dB was obtained.
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2013.2979
  • Filename
    6649535