DocumentCode
715232
Title
Reverse recovery time reworking of fast recovery diodes for industrial production
Author
Itthikusumarn, W. ; Jakphet, W. ; Titiroongruang, W.
Author_Institution
Dept. of Electron. Eng., King Mongkut´s Inst. of Technol. Ladkrabang, Bangkok, Thailand
fYear
2015
fDate
4-6 May 2015
Firstpage
1
Lastpage
3
Abstract
For industrial field, cost is one of the most important factors. Especially discrete devices like a fast recovery diodes which are produced by complicated processes. In case of over trr defect, reworking is required to limit the cost which is increased. Owing to simple applied to finished products, electron beam irradiation is presented to rework them. This study have exposed the irradiation to finished fast diodes which high trr (300-400 ns) and considered effects of irradiation on fast diodes after exposed. The result of experiment shows irradiation can reduce trr after exposed depend on irradiation doses from average trr 350ns to 100, 60, 50, 40 and 35ns, for irradiation dose 50, 100, 150, 200, 250 and 300kGy respectively. Notwithstanding fast diodes after exposed were degraded by irradiation. Forward voltage is added double at 50kGy and more in larger doses and reversed leakage current is also slightly increased but did not affect to breakdown voltage.
Keywords
industrial engineering; p-i-n diodes; breakdown voltage; cost factors; discrete devices; electron beam irradiation; fast recovery diodes; finished products; forward voltage; industrial field; industrial production; irradiation doses; reverse recovery time reworking; reversed leakage current; Electron beams; P-i-n diodes; Production; Radiation effects; Schottky diodes; Silicon; Mesa structure; electron beam irradiation; fast recovery diodes; reversed recovery time;
fLanguage
English
Publisher
ieee
Conference_Titel
Next-Generation Electronics (ISNE), 2015 International Symposium on
Conference_Location
Taipei
Type
conf
DOI
10.1109/ISNE.2015.7132020
Filename
7132020
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