An immersion scanner enabling 10 nm half pitch production and high productivity

Author

Suzuki, Tsuyoshi ; Egashira, Hiroyuki ; Shirata, Yosuke ; Matsuyama, Tomoyuki ; Imai, Motokatsu ; Kanaya, Reiji ; Tsuzuki, Takao

Author_Institution

Nikon Corp., Saitama, Japan

fYear

2015

fDate

15-16 March 2015

Firstpage

1

Lastpage

3

Abstract

Nikon´s newly developed immersion scanner, NSR-S630D, provides exceptional performance in product overlay, CD uniformity, and productivity at 10 nm hp node and beyond. Generally, maintaining machine accuracy and productivity at a high level is difficult because they are in a trade-off relationship. The NSR-S630D is equipped with new features including an encoder servo-controlled reticle stage, reticle bending mechanism, optics with enhanced thermal aberration control, and thermally stable wafer stage. These features enable the NSR-S630D to deliver highest accuracy and productivity.

Keywords

aberrations; optical scanners; reticles; CD productivity; CD uniformity; NSR-S630D; Nikon immersion scanner; encoder servo-controlled reticle stage; half pitch production; machine accuracy; machine productivity; product overlay; reticle bending mechanism; size 10 nm; thermal aberration control; thermally stable wafer stage; Accuracy; Calibration; Optics; Power system stability; Productivity; Stability analysis; Thermal stability;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Technology International Conference (CSTIC), 2015 China

Conference_Location

Shanghai

ISSN

2158-2297

Type

conf

DOI

10.1109/CSTIC.2015.7153350

Filename

7153350