Fabrication and characterization of Co2MnSi thin film with an extreme low damping constant

Author

Qiao, S. ; Zhang, J. ; Hao, R. ; Zhaong, H. ; Kang, Y. ; Kang, S.

Author_Institution

Phys., Shandong Univ., Jinan, China

fYear

2015

fDate

11-15 May 2015

Firstpage

1

Lastpage

1

Abstract

This study deals with the fabrication and magnetic characterization of Co₂MnSi thin film with an extremely low Gilbert damping constant. The thin film is prepared by dc magnetron sputtering onto MgO (001) substrate using stoichiometric alloy target and post-annealed at 500°C for 1 h. X-ray diffraction and high-resolution transmission electron microscopy are used to determine film structure and microstructure. The hysteresis loops and saturated magnetization are measured by alternating gradient magnetometry while the magnetization dynamics are studied by ferromagnetic resonance at 5-40 GHz.

Keywords

X-ray diffraction; annealing; cobalt alloys; crystal microstructure; ferromagnetic materials; ferromagnetic resonance; magnetic hysteresis; magnetic thin films; magnetometry; manganese alloys; metallic thin films; silicon alloys; sputter deposition; transmission electron microscopy; Co₂MnSi; Gilbert damping constant; MgO; X-ray diffraction; alternating gradient magnetometry; dc magnetron sputtering; ferromagnetic resonance; frequency 5 GHz to 40 GHz; high-resolution transmission electron microscopy; hysteresis loops; magnetization dynamics; microstructure; post-annealing; saturated magnetization; stoichiometric alloy target; temperature 500 degC; thin film; time 1 h; Damping; Magnetic hysteresis; Magnetic resonance; Magnetic tunneling; Magnetomechanical effects; Perpendicular magnetic anisotropy;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference (INTERMAG), 2015 IEEE

Conference_Location

Beijing

Print_ISBN

978-1-4799-7321-7

Type

conf

DOI

10.1109/INTMAG.2015.7156903

Filename

7156903