Influence of the preparation process and target composition on crystal structure and magnetic properties of NdFeB thin films

Author

Su, H. ; Zhang, J. ; Du, J. ; Xia, W. ; Yan, A. ; Liu, J.

Author_Institution

Key Lab. of Magn. Mater. & Devices, Ningbo Inst. of Mater. Technol. & Eng., Ningbo, China

fYear

2015

fDate

11-15 May 2015

Firstpage

1

Lastpage

1

Abstract

NdFeB thin films prepared by target with different Nd content is investigated in this study. The influence of annealing conditions, deposition temperature and sputtering power on single-layer NdFeB films are discussed. The permanent magnet performance with the values as high as u₀M_r=1 .32 T, u₀H_c=1226 kA/m and (BH)_max=378 kJ/m³ was obtained. Observations show that saturation magnetization decreases with the ascension of sputtering power at the same target composition.

Keywords

annealing; boron alloys; crystal structure; iron alloys; magnetic thin films; magnetisation; metallic thin films; neodymium alloys; permanent magnets; sputter deposition; NdFeB; annealing; crystal structure; deposition temperature; magnetic properties; permanent magnet; saturation magnetization; single-layer thin films; sputtering power; target composition; Annealing; Films; Magnetic hysteresis; Magnetic properties; Saturation magnetization; Sputtering; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference (INTERMAG), 2015 IEEE

Conference_Location

Beijing

Print_ISBN

978-1-4799-7321-7

Type

conf

DOI

10.1109/INTMAG.2015.7157725

Filename

7157725