DocumentCode :
723095
Title :
Embedded power insert enabling dual-side cooling of microprocessors
Author :
Brunschwiler, Thomas ; Gschwend, Dominic ; Paredes, Stephan ; Tick, Timo ; Matsumoto, Keiji ; Lehnberger, Christoph ; Pohl, Jens ; Zschenderlein, Uwe ; Oggioni, Stefano
Author_Institution :
IBM Res. - Zurich, R üschlikon, Switzerland
fYear :
2015
fDate :
26-29 May 2015
Firstpage :
833
Lastpage :
838
Abstract :
A dual-side cooling topology is proposed that is achieved by embedding a power insert into the organic substrate of a chip or chip stack. The power insert consists of vertical copper lamellas supporting lateral current feed in addition to vertical heat dissipation at minimal electrical and thermal gradients. The lateral current feed capability is key to enable the introduction of the cold plate on the bottom side of the substrate. Thermal and electrical finite-element modeling was performed to determine the optimal pitch of the power insert lamella of 270 μm and 350 μm to obtain a total thermal resistance of 21 K-mm2/W and a voltage drop of 2 mV, respectively. The 10 × 10 mm2 power inserts are fabrication by means of a copper and prepreg lamination process, followed by a sawing and polishing singulation step. The embedding of the power insert is described, considering additional redistribution layers to accommodate also smaller interconnect pitches on the chip side. The effective thermal conductivity of the power insert was derived by bulk-thermal measurement and yielded 320±50 W/m-K, ten times the performance of state-of-the-art substrates with thermal via arrays. Finally, we demonstrate the benefits of the dual-side cooling approach in a thermal benchmark study that compares it with back- and front-side cooling. Dual-side cooling not only halfs the total thermal resistance, but also enables the integration of pyramid-like chip stacks and the placement of high-power dies in the bottom tiers of a stack.
Keywords :
cooling; embedded systems; finite element analysis; microprocessor chips; thermal conductivity; thermal management (packaging); thermal resistance; cold plate; dual-side cooling topology; finite-element modeling; high-power dies; interconnect pitches; lateral current feed; microprocessors; minimal electrical gradients; organic substrate; polishing singulation step; power insert; prepreg lamination process; pyramid-like chip stacks; redistribution layers; sawing singulation step; size 270 mum; size 350 mum; thermal conductivity; thermal gradients; thermal resistance; thermal via arrays; vertical copper lamellas; vertical heat dissipation; voltage 2 mV; Cooling; Copper; Heating; Substrates; Thermal resistance; Topology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
Conference_Location :
San Diego, CA
Type :
conf
DOI :
10.1109/ECTC.2015.7159689
Filename :
7159689
Link To Document :
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