• DocumentCode
    723104
  • Title

    Demonstration of 20µm pitch micro-vias by excimer laser ablation in ultra-thin dry-film polymer dielectrics for multi-layer RDL on glass interposers

  • Author

    Suzuki, Yuya ; Brune, Jan ; Senczuk, Rolf ; Patzel, Rainer ; Furuya, Ryuta ; Fuhan Liu ; Sundaram, Venky ; Tummala, Rao

  • Author_Institution
    R&D Center, Zeon Corp., Kawasaki, Japan
  • fYear
    2015
  • fDate
    26-29 May 2015
  • Firstpage
    922
  • Lastpage
    927
  • Abstract
    This paper describes the first demonstration of 8-10μm diameter micro-vias at 20μm pitch in ultra-thin dry-film polymer dielectrics to achieve high-density and low-cost redistribution layers (RDL) on panel-based glass and organic interposers. A polymer dielectric dry-film, ZEONIF ZS100, at 10μm thickness was double side laminated on thin and low CTE glass and organic substrates. Micro-via arrays at 20μm pitch were formed by 248nm KrF excimer laser ablation using mask projection scanning, and metallized by a semi-additive process (SAP) using electroless and electrolytic copper plating, with no chemical-mechanical polishing to form fully filled via structures. Fully-filled micro-vias at 20um were achieved using processes scalable to large panels for low-cost and high-density 2.5D and 3D interposers.
  • Keywords
    electroplating; integrated circuit interconnections; laser ablation; three-dimensional integrated circuits; vias; ZEONIF ZS100; electroless copper plating; electrolytic copper plating; excimer laser ablation; fully filled via structures; glass interposers; high density redistribution layer; low cost redistribution layer; mask projection scanning; multilayer RDL; organic interposer; panel based glass; pitch microvias; polymer dielectric dry film; semi additive process; size 20 mum; size 8 mum to 10 mum; ultrathin dry film polymer dielectrics; Copper; Dielectrics; Laser ablation; Laser noise; Polymers; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
  • Conference_Location
    San Diego, CA
  • Type

    conf

  • DOI
    10.1109/ECTC.2015.7159704
  • Filename
    7159704