• DocumentCode
    723233
  • Title

    Scanning acoustic microscopy and shear wave imaging mode performances for failure detection in high-density microassembling technologies

  • Author

    Remili, Z. ; Ousten, Y. ; Levrier, B. ; Suhir, E. ; Bechou, L.

  • Author_Institution
    IMS Lab., Univ. of Bordeaux, Talence, France
  • fYear
    2015
  • fDate
    26-29 May 2015
  • Firstpage
    2090
  • Lastpage
    2101
  • Abstract
    This paper reports results on application of scanning acoustic microscopy (SAM) for analysis of high-density microassembling technologies such as BGA and TSV. We have demonstrated the interest of an original and dedicated model based on the calculations of the in-depth Point-Spread Function (namely PSF) corresponding to an extension of that of proposed in literature but restricted to the surface of an object. Our model includes the well-known decomposition of an acoustic wave into a solid specimen but also diffraction, calculations of geometrical aberrations and can predict the focal plane distribution (lateral resolution) at a specific focus depth according the Rayleigh diffraction theory. Specific test patterns have been used for metrology evaluation into different materials especially at high acoustic velocities. A specific attention is paid to the application of shear wave imaging capabilities in comparison of longitudinal wave imaging mode for the analysis of stress distribution along an interface from a qualitative point of view believing that one can provide complementary information on stress analysis in contrast of classical B or C-SCAN longitudinal imaging mode. Finally, some applications are given on the well-established Ball-Grid-Array (SBC-BGA) technology still remaining an interest in today´s electronic packaging technology and then on a specific TSV design that is currently studied in the framework of the European “MASTER_3D” project. FEM modeling and analytical predictive stress model, implemented and reported in recent published papers, have been compared with SAM imaging results. Non-destructive micro-Raman spectroscopy is also considered to estimate the stress profile into the silicon wafer around circular TSVs by monitoring the wavelength shift of the Raman peak along the radial distance.
  • Keywords
    Raman spectroscopy; acoustic microscopy; ball grid arrays; elastic waves; focal planes; microassembling; optical transfer function; stress analysis; Raman peak; Rayleigh diffraction theory; ball-grid-array technology; circular TSV; electronic packaging technology; failure detection; focal plane distribution; high-density microassembling technologies; in-depth point-spread function; non-destructive micro-Raman spectroscopy; scanning acoustic microscopy; shear wave imaging mode performances; silicon wafer; stress analysis; stress profile; wavelength shift; Acoustics; Attenuation; Image resolution; Imaging; Mathematical model; Probes; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
  • Conference_Location
    San Diego, CA
  • Type

    conf

  • DOI
    10.1109/ECTC.2015.7159891
  • Filename
    7159891