DocumentCode
723233
Title
Scanning acoustic microscopy and shear wave imaging mode performances for failure detection in high-density microassembling technologies
Author
Remili, Z. ; Ousten, Y. ; Levrier, B. ; Suhir, E. ; Bechou, L.
Author_Institution
IMS Lab., Univ. of Bordeaux, Talence, France
fYear
2015
fDate
26-29 May 2015
Firstpage
2090
Lastpage
2101
Abstract
This paper reports results on application of scanning acoustic microscopy (SAM) for analysis of high-density microassembling technologies such as BGA and TSV. We have demonstrated the interest of an original and dedicated model based on the calculations of the in-depth Point-Spread Function (namely PSF) corresponding to an extension of that of proposed in literature but restricted to the surface of an object. Our model includes the well-known decomposition of an acoustic wave into a solid specimen but also diffraction, calculations of geometrical aberrations and can predict the focal plane distribution (lateral resolution) at a specific focus depth according the Rayleigh diffraction theory. Specific test patterns have been used for metrology evaluation into different materials especially at high acoustic velocities. A specific attention is paid to the application of shear wave imaging capabilities in comparison of longitudinal wave imaging mode for the analysis of stress distribution along an interface from a qualitative point of view believing that one can provide complementary information on stress analysis in contrast of classical B or C-SCAN longitudinal imaging mode. Finally, some applications are given on the well-established Ball-Grid-Array (SBC-BGA) technology still remaining an interest in today´s electronic packaging technology and then on a specific TSV design that is currently studied in the framework of the European “MASTER_3D” project. FEM modeling and analytical predictive stress model, implemented and reported in recent published papers, have been compared with SAM imaging results. Non-destructive micro-Raman spectroscopy is also considered to estimate the stress profile into the silicon wafer around circular TSVs by monitoring the wavelength shift of the Raman peak along the radial distance.
Keywords
Raman spectroscopy; acoustic microscopy; ball grid arrays; elastic waves; focal planes; microassembling; optical transfer function; stress analysis; Raman peak; Rayleigh diffraction theory; ball-grid-array technology; circular TSV; electronic packaging technology; failure detection; focal plane distribution; high-density microassembling technologies; in-depth point-spread function; non-destructive micro-Raman spectroscopy; scanning acoustic microscopy; shear wave imaging mode performances; silicon wafer; stress analysis; stress profile; wavelength shift; Acoustics; Attenuation; Image resolution; Imaging; Mathematical model; Probes; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
Conference_Location
San Diego, CA
Type
conf
DOI
10.1109/ECTC.2015.7159891
Filename
7159891
Link To Document