Layout optimization and template pattern verification for directed self-assembly (DSA)

Author

Zigang Xiao ; Daifeng Guo ; Wong, Martin D. F. ; He Yi ; Tung, Maryann C. ; Wong, H.-S Philip

Author_Institution

Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA

fYear

2015

fDate

8-12 June 2015

Firstpage

1

Lastpage

6

Abstract

Recently, block copolymer directed self-assembly (DSA) has demonstrated great advantages in patterning contacts/vias for the 7 nm technology node and beyond. The high throughput and low process cost of DSA makes it the most promising candidate in patterning tight pitched dense patterns for the next generation lithography. Since DSA is very sensitive to the shapes and distributions of the guiding templates, it is necessary to develop new EDA algorithms and tools to address the patterning rules and constraints of the process. This paper presents a set of DSA-aware optimization techniques targeting the most urgent problems for DSA technology, including layout optimization and template pattern verification.

Keywords

nanolithography; nanopatterning; optimisation; polymer blends; self-assembly; DSA technology; DSA-aware optimization techniques; EDA algorithms; block copolymer; directed self-assembly; guiding templates; layout optimization; next generation lithography; patterning rules; pitched dense patterns; size 7 nm; template pattern verification; Layout; Libraries; Lithography; Optimization; Routing; Shape; Wires; Directed Self-Assembly; Layout Optimization; Machine Learning; Template Verification;

fLanguage

English

Publisher

ieee

Conference_Titel

Design Automation Conference (DAC), 2015 52nd ACM/EDAC/IEEE

Conference_Location

San Francisco, CA

Type

conf

DOI

10.1145/2744769.2747934

Filename

7167384