Effective two-dimensional pattern generation for self-aligned double patterning

In nano-scale systems, design for manufacturability is essentially required. For sub 20 nm technology node, Self-Aligned Double Patterning (SADP) is an important manufacturing technique, and complex two-dimensional patterns are requested to be fabricated by SADP. However all two-dimensional patterns cannot be fabricated by SADP. In this paper, two-dimensional patterns that satisfy connection requirements as well as manufacturability by SADP are effectively derived by our proposed approach in which partially pre-colored two-color base grid is used.