• DocumentCode
    731091
  • Title

    Simulation of ion redistribution in a vacuum chamber during magnetron sputtering of coatings

  • Author

    Saifullin, Elmir R.

  • Author_Institution
    Nat. Res. Tomsk State Univ., Tomsk, Russia
  • fYear
    2015
  • fDate
    24-28 May 2015
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    A model is suggested to describe ion redistribution in a vacuum chamber during magnetron sputtering of a two-component coating. Magnetron sputtering is a technology for depositing thin films on a substrate using a cathodic sputtering target in a magnetron plasma discharge.
  • Keywords
    coatings; sputter deposition; thin films; cathodic sputtering target; depositing thin films; ion redistribution; magnetron plasma discharge; magnetron sputtering; two-component coating; vacuum chamber; Angular velocity; Coatings; Magnetic films; Mathematical model; Numerical models; Sputtering; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Sciences (ICOPS), 2015 IEEE International Conference on
  • Conference_Location
    Antalya
  • Type

    conf

  • DOI
    10.1109/PLASMA.2015.7179552
  • Filename
    7179552
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=731091