• DocumentCode
    732535
  • Title

    Status and potential of laser based EUV sources

  • Author

    Endo, Akira

  • Author_Institution
    HiLase Center, Inst. of Phys., Dolni Brezany, Czech Republic
  • fYear
    2015
  • fDate
    10-15 May 2015
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The established EUV source for lithography is driven by a high average power pulsed CO2 laser. Micro droplet of Tin is injected as the plasma source. Present average power is more than 100W, and the scaling potential to over kW is described regarding several physical limits.
  • Keywords
    laser materials processing; photolithography; plasma sources; ultraviolet sources; high average power pulsed carbon dioxide laser; laser based EUV sources; lithography; plasma source; tin microdroplet; Apertures; Lithography; Optical reflection; Plasmas; Reflectivity; Tin; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2015 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    7182968
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=732535