Polarization sensitive printing by ultrafast laser nanostructuring in amorphous silicon

Author

Drevinskas, Rokas ; Beresna, Martynas ; Gecevicius, Mindaugas ; Khenkin, Mark ; Kazanskii, Andrey G. ; Konkov, Oleg I. ; Kazansky, Peter G.

Author_Institution

Optoelectron. Res. Centre, Univ. of Southampton, Southampton, UK

fYear

2015

fDate

10-15 May 2015

Firstpage

1

Lastpage

2

Abstract

We demonstrate femto- and picosecond laser assisted nanostructuring of hydrogenated amorphous silicon (a-Si:H). The laser-induced periodic sub-wavelength structures exhibit the dichroism and giant form birefringence giving extra dimensions to the polarization sensitive image recording.

Keywords

amorphous semiconductors; birefringence; dichroism; elemental semiconductors; high-speed optical techniques; hydrogen; laser materials processing; light polarisation; nanofabrication; nanophotonics; optical images; printing; silicon; Si:H; amorphous silicon; dichroism; femtosecond laser assisted nanostructuring; giant form birefringence; hydrogenated amorphous silicon; laser-induced periodic sub-wavelength structures; picosecond laser assisted nanostructuring; polarization sensitive image recording; polarization sensitive printing; ultrafast laser nanostructuring; Optical films; Optical imaging; Optical polarization; Optical pulses; Optical sensors; Ultrafast optics;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics (CLEO), 2015 Conference on

Conference_Location

San Jose, CA

Type

conf

Filename

7183770