• DocumentCode
    74244
  • Title

    Wideband and Compact TE-Pass/TM-Stop Polarizer Based on a Hybrid Plasmonic Bragg Grating for Silicon Photonics

  • Author

    Jihua Zhang ; Cassan, Eric ; Xinliang Zhang

  • Author_Institution
    Wuhan Nat. Lab. for Optoelectonics, Huazhong Univ. of Sci. & Technol., Wuhan, China
  • Volume
    32
  • Issue
    7
  • fYear
    2014
  • fDate
    1-Apr-14
  • Firstpage
    1383
  • Lastpage
    1386
  • Abstract
    Based on a transverse electric (TE)/transverse magnetic (TM) polarization diversity waveguide, we theoretically propose a TE-pass/TM-stop polarizer by etching a polarization dependent Bragg grating into the oxide layer of a silicon/thin SiO2 gap/metal cap hybrid plasmonic waveguide. The simulation results indicate that the device is characterized by high TE-transmission and large TM-reflection levels in a wide waveband from 1.48 to 1.7 μm combined with an excellent compactness (length less than 5 μm). Transmission and reflection extinction ratio are both larger than 17.1 dB in the 1.48-1.64 μm wavelength range, while losses are smaller than 1.36 and 0.69 dB for the TE and TM modes, respectively.
  • Keywords
    Bragg gratings; elemental semiconductors; etching; infrared spectra; light polarisation; optical losses; optical polarisers; optical waveguides; plasmonics; silicon; silicon compounds; Si-SiO2; TE modes; TE-transmission; TM modes; TM-reflection levels; compact TE-pass-TM-stop polarizer; etching; hybrid plasmonic Bragg grating; oxide layer; polarization dependent Bragg grating; reflection extinction ratio; silicon photonics; silicon-thin SiO2 gap-metal cap hybrid plasmonic waveguide; transmission extinction ratio; transverse electric-transverse magnetic polarization diversity waveguide; wavelength 1.48 mum to 1.7 mum; wideband TE-pass-TM-stop polarizer; Bragg gratings; Gratings; Metals; Optimized production technology; Plasmons; Reflection; Silicon; Bragg grating; hybrid plasmonic waveguide (HPW); polarization diversity; polarizer; silicon photonics; surface plasmons;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2014.2302304
  • Filename
    6720195