• DocumentCode
    74552
  • Title

    Spatial Distribution of a High-Power Impulse Magnetron Sputtering Glow Plasma by a Controlled Unbalanced Magnetic Field

  • Author

    Konishi, Tsuyoshi ; Takaki, K. ; Yukimura, Ken

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Iwate Univ., Morioka, Japan
  • Volume
    42
  • Issue
    10
  • fYear
    2014
  • fDate
    Oct. 2014
  • Firstpage
    2786
  • Lastpage
    2787
  • Abstract
    Spatial distribution of a high-power impulse magnetron sputtering carbon-glow plasma was investigated using a controlled unbalanced magnetic field, where a number of the inner magnets were varied. The magnets were arranged in a concentric circle and their number affected the production-zone of the plasma on the target, which simultaneously changed the instantaneous power consumed in the plasma. The plasma was produced at the region with the peak magnetic-field density and extended outward radially on the target with an increased number of the inner magnets.
  • Keywords
    carbon; glow discharges; plasma sources; sputtering; C; high-power impulse magnetron sputtering carbon-glow plasma; magnetic-field density; plasma production-zone; spatial distribution; Argon; Carbon; Distribution functions; Graphical models; Magnetic devices; Plasmas; Sputtering; Glow discharge devices; high-power impulse magnetron sputtering (HiPIMS); high-power pulsed magnetron sputtering (HPPMS); ion sources; plasma density; plasma density.;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2014.2326194
  • Filename
    6846309