DocumentCode
74552
Title
Spatial Distribution of a High-Power Impulse Magnetron Sputtering Glow Plasma by a Controlled Unbalanced Magnetic Field
Author
Konishi, Tsuyoshi ; Takaki, K. ; Yukimura, Ken
Author_Institution
Dept. of Electr. & Electron. Eng., Iwate Univ., Morioka, Japan
Volume
42
Issue
10
fYear
2014
fDate
Oct. 2014
Firstpage
2786
Lastpage
2787
Abstract
Spatial distribution of a high-power impulse magnetron sputtering carbon-glow plasma was investigated using a controlled unbalanced magnetic field, where a number of the inner magnets were varied. The magnets were arranged in a concentric circle and their number affected the production-zone of the plasma on the target, which simultaneously changed the instantaneous power consumed in the plasma. The plasma was produced at the region with the peak magnetic-field density and extended outward radially on the target with an increased number of the inner magnets.
Keywords
carbon; glow discharges; plasma sources; sputtering; C; high-power impulse magnetron sputtering carbon-glow plasma; magnetic-field density; plasma production-zone; spatial distribution; Argon; Carbon; Distribution functions; Graphical models; Magnetic devices; Plasmas; Sputtering; Glow discharge devices; high-power impulse magnetron sputtering (HiPIMS); high-power pulsed magnetron sputtering (HPPMS); ion sources; plasma density; plasma density.;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2014.2326194
Filename
6846309
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