Title :
Performance estimation and yield analysis of an OEIC passive duplexer
Author :
Chipouras, A. ; Markatos, S. ; Sphicopoulos, T. ; Caroubalos, C. ; Mahlein, Hans F. ; Matz, R.
Author_Institution :
Div. of Commun. & Signal Process., Nat. Tech. Univ. of Athens, Greece
fDate :
2/1/1996 12:00:00 AM
Abstract :
For the design and fabrication of an OEIC duplexer an analysis has been performed to estimate the influence of fabrication imperfections of cross-sectional and dispersive design parameters on the operation of the device. Required fabrication tolerances and yield can thus be predicted
Keywords :
integrated circuit design; integrated circuit yield; integrated optoelectronics; multiplexing equipment; optical design techniques; optical dispersion; optical fabrication; wavelength division multiplexing; OEIC duplexer design; OEIC duplexer fabrication; OEIC passive duplexer; cross-sectional; dispersive design parameters; performance estimation; required fabrication tolerances; yield analysis; Directional couplers; Dispersion; Optical device fabrication; Optoelectronic devices; Performance analysis; Polynomials; Transceivers; Waveguide components; Wavelength division multiplexing; Yield estimation;
Journal_Title :
Lightwave Technology, Journal of
