• DocumentCode
    749072
  • Title

    Anomalous temperature-dependent characteristics of silicon diffused resistors

  • Author

    Chuang, Hung-Ming ; Tsai, Sheng-Fu ; Thei, Kong-Beng ; Liu, Wen-Chau

  • Author_Institution
    Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan, Taiwan
  • Volume
    39
  • Issue
    13
  • fYear
    2003
  • fDate
    6/26/2003 12:00:00 AM
  • Firstpage
    1015
  • Lastpage
    1016
  • Abstract
    The temperature-dependent characteristics of silicon diffused resistors are demonstrated and studied. Based on the presence of a silicide/silicon junction, the device size plays an important role on diffused resistor behaviours. From experimental and theoretical analysis, some important parameters, e.g. the interface resistance (Rinterface), sheet resistance (Rbulk), deviations of resistor length (ΔL) and width (ΔW ) are obtained. Also, anomalous phenomena of temperature coefficient of resistance (TCR) are found.
  • Keywords
    CMOS integrated circuits; electrostatic discharge; isolation technology; resistors; CMOS; ESD protection circuits; anomalous temperature-dependent characteristics; device size; diffused resistors; interface resistance; resistor length; resistor width; sheet resistance; temperature coefficient of resistance;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20030659
  • Filename
    1214813
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=749072