DocumentCode :
751892
Title :
Inverse modeling and its application in the design of high electron mobility transistors
Author :
Ahn, Hyungkeun ; El Nokali, Mahmoud A.
Author_Institution :
Dept. of Electr. Eng., Pittsburgh Univ., PA, USA
Volume :
42
Issue :
4
fYear :
1995
fDate :
4/1/1995 12:00:00 AM
Firstpage :
598
Lastpage :
604
Abstract :
An inverse modeling technique is introduced to determine the structural and physical parameters of HEMT from the desired data for maximum transconductance. The technique is based on the availability of analytical expressions describing the electron carrier concentration, the current, the transconductance, the capacitances and the unity current gain frequency of a HEMT. Empirical formulae are obtained that relate the maximum transconductance to the doped AlGaAs thickness, spacer layer thickness, dopant density and aluminum mole fraction. The technique is applied to the design of a HEMT and shows good agreement with the experimental data
Keywords :
III-V semiconductors; aluminium compounds; carrier density; design engineering; gallium arsenide; high electron mobility transistors; microwave field effect transistors; semiconductor device models; semiconductor doping; Al mole fraction; AlGaAs-GaAs; HEMT design; capacitance; dopant density; doped AlGaAs thickness; electron carrier concentration; high electron mobility transistors; inverse modeling technique; maximum transconductance; microwave device; spacer layer thickness; unity current gain frequency; Aluminum; Capacitance; Circuits; Electrical resistance measurement; Frequency; HEMTs; Inverse problems; MODFETs; Structural engineering; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.372060
Filename :
372060
Link To Document :
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