• DocumentCode
    752292
  • Title

    Generation of multiply-charged metal ions in vacuum arc plasmas

  • Author

    Oks, Efim M.

  • Author_Institution
    High Current Electron. Inst., Acad. of Sci., Tomsk, Russia
  • Volume
    30
  • Issue
    1
  • fYear
    2002
  • fDate
    2/1/2002 12:00:00 AM
  • Firstpage
    202
  • Lastpage
    207
  • Abstract
    The status of experimental research aimed at enhancing the ion charge states in vacuum are plasmas is reviewed. Strong magnetic fields, high-current arc "spikes," and intense electron beams have been used, separately, to increase the metal ion charge states produced. For each method, systematic measurements of ion charge state distributions were made. Each method has its advantages and disadvantages and each method does result in an increase in the mean ion charge state by up to a factor of 2.4, in the work carried out to-date. The last method, use of An added intense electron beam for enhanced ion stripping, is the most effective and work in this direction is being pursued further
  • Keywords
    ion sources; ionisation; metals; plasma applications; reviews; vacuum arcs; charge state enhancement; high-current arc spikes; intense electron beam; intense electron beams; ion charge state distributions; ion stripping; mean ion charge state; multiple ionization; multiply-charged metal ion generation; strong magnetic fields; vacuum arc ion sources; vacuum arc plasmas; Electron beams; Ion beams; Ion sources; Ionization; Magnetic field measurement; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma sources; Vacuum arcs;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2002.1003861
  • Filename
    1003861