DocumentCode
75307
Title
Silicon-on-Glass Dielectric Waveguide—Part II: For THz Applications
Author
Ranjkesh, Nazy ; Basha, Mohamed ; Taeb, Aidin ; Safavi-Naeini, Safieddin
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Waterloo, Waterloo, ON, Canada
Volume
5
Issue
2
fYear
2015
fDate
Mar-15
Firstpage
280
Lastpage
287
Abstract
A low-loss sub-millimeter-wave/THz integrated dielectric waveguide is presented. The proposed waveguide consists of a highly resistive Silicon (Si) guiding channel bonded to a glass substrate. To reduce the waveguide insertion loss due to the glass substrate, part of the substrate below the Si guiding channel is etched. A periodic configuration of supporting beams is used to hold the Si guiding channel over the glass substrate. A low-cost and high-precision fabrication process, which is fully compatible with current Si-based fabrication technologies, is developed for the proposed waveguide. Numerical simulations and experiments are conducted to investigate the performance of the proposed waveguide. Measured attenuation constant of the proposed waveguide is 0.0346 dB/ λo (average value) over the 440-500 GHz band.
Keywords
dielectric waveguides; elemental semiconductors; glass; semiconductor device models; silicon; submillimetre wave integrated circuits; terahertz wave devices; Si-SiO2; SiO2; attenuation constant; etching; frequency 440 GHz to 500 GHz; glass substrate; highly resistive silicon guiding channel; low-loss THz integrated dielectric waveguide; low-loss submillimeter-wave integrated dielectric waveguide; numerical simulations; periodic configuration; silicon-on-glass dielectric waveguide; waveguide insertion loss; Fabrication; Glass; Insertion loss; Rectangular waveguides; Silicon; Substrates; Waveguide transitions; Dielectric waveguide; Silicon-on-Glass (SOG) waveguide; THz integrated circuit;
fLanguage
English
Journal_Title
Terahertz Science and Technology, IEEE Transactions on
Publisher
ieee
ISSN
2156-342X
Type
jour
DOI
10.1109/TTHZ.2015.2397279
Filename
7047242
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