DocumentCode
753308
Title
Spatial and temporal variation of the ion flux impinging on the wafer surface in presence of a plasma instability
Author
Kim, Tae Won ; Aydil, Eray S.
Author_Institution
Dept. of Chem. Eng., California Univ., Santa Barbara, CA, USA
Volume
30
Issue
1
fYear
2002
fDate
2/1/2002 12:00:00 AM
Firstpage
120
Lastpage
121
Abstract
An array of planar Langmuir probes built on the surface of a 75-mm diameter Si wafer was used to measure the spatial and temporal variation of the ion flux impinging on the wafer surface in presence of a plasma instability
Keywords
Langmuir probes; plasma instability; plasma materials processing; Si wafer; ion flux impinging; planar Langmuir probes; plasma instability; spatial variation; temporal variation; wafer surface; Coils; Etching; Inductors; Plasma applications; Plasma density; Plasma displays; Plasma materials processing; Plasma measurements; Plasma stability; Probes;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2002.1003953
Filename
1003953
Link To Document