DocumentCode
753579
Title
Different discharge regimes in a microwave cavity coupling system used for the generation of moderate pressure H2 and H2 /CH4 plasmas
Author
Hassouni, Khaled ; Grotjohn, Timothy A. ; Gicquel, Alix
Author_Institution
LIMHP, CNRS-UPR1311, Villetaneuse, France
Volume
30
Issue
1
fYear
2002
fDate
2/1/2002 12:00:00 AM
Firstpage
172
Lastpage
173
Abstract
Simulated two-dimensional distributions of absorbed power density in a moderate pressure H2 plasma obtained using a microwave cavity coupling system are presented. In a first set of simulation, we analyze the change in the power density distribution when input power is increased at a constant pressure. Then, we investigate the evolution of this distribution when the average power density is increased by simultaneously increasing the input power and the pressure while keeping the plasma volume constant
Keywords
discharges (electric); hydrogen; organic compounds; plasma pressure; plasma simulation; H2; absorbed power density; average power density; discharge regimes; evolution; hydrogen discharges; input power; microwave cavity coupling system; microwave cavity-coupling system; moderate pressure H2 plasmas; moderate pressure H2-CH4 plasmas; moderate pressure H2-methane plasmas; plasma simulation; plasma volume; power density distribution; pressure; self-consistent simulation; simulated two-dimensional distributions; Electromagnetic coupling; Electrons; Fault location; Inductors; Maxwell equations; Microwave generation; Plasma density; Plasma materials processing; Plasma simulation; Plasma temperature;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2002.1003979
Filename
1003979
Link To Document