Self-aligned broad-beam ion optics

Author

Lossy, Richard ; Engemann, Jürgen ; Ünal, Nezih

Author_Institution

Wuppertal Univ., Germany

Volume

39

Issue

2

fYear

1992

fDate

2/1/1992 12:00:00 AM

Firstpage

444

Lastpage

447

Abstract

A new type of broad-beam ion optics has been developed. It avoids misalignment of the electrode grids and can be installed without any adjustment procedure. The compact ion optics is a two-electrode system that is aligned by the fabrication process. A ceramic carrier is used as a base plate. The electrodes are deposited as films on both sides of the carrier. This fabrication process ensures that the position of the grids is fixed to each other for the entire life of the ion optics. By this procedure the geometrical factors influencing the beam properties remain constant. The extraction optics were tested in a broad-beam RF-ion source designed for reactive gas operation. The values for the ion currents obtained are comparable to values from conventional multi-aperture ion optics. Ion current densities in the range of 1 mA/cm ² could be measured. Beam divergence has been measured and values are similar to those from conventional ion optics

Keywords

ion optics; ion sources; sputter deposition; sputter etching; beam divergence; broad-beam RF-ion source; broad-beam ion optics; ceramic carrier; compact ion optics; extraction optics; fabrication process; ion current density; ion currents; multi-aperture ion optics; self aligned ion optics; two-electrode system; Ceramics; Current density; Density measurement; Electrodes; Geometrical optics; Optical design; Optical device fabrication; Optical films; Particle beam optics; Testing;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/16.121705

Filename

121705