Title :
A novel in-line automated metrology for photolithography
Author :
Leang, Sovarong ; Spanos, Costas J.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fDate :
2/1/1996 12:00:00 AM
Abstract :
Novel metrology has been developed for measuring in situ film thickness and absorption coefficient simultaneously. Designed specifically for photolithography processes, this metrology if applied to photoresist films, can measure thickness and photoactive compound concentration in situ, which are important parameters for photolithography process control and diagnosis
Keywords :
absorption coefficients; optical variables measurement; photolithography; photoresists; thickness measurement; absorption coefficient; in situ measurements; in-line automated metrology; photoactive compound concentration; photolithography; photoresist films; process control; process diagnosis; thickness; Absorption; Condition monitoring; Lithography; Metrology; Optical films; Process control; Reflectivity; Resists; Semiconductor device modeling; Thickness measurement;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
